Multilevel magnetic recording in bit patterned media for areal densities above 5 Terabit-per-square-inch

The project aims at developing a new magnetic recording media at a proof-of-concept level for ultrahigh density magnetic storage applications, by using low-cost, environmentally friendly processes, and both advanced and new nanotechnologies.[1] It has been shown that 40 nm period island arrays with almost perfect ordering on flat SiO2 substrate surfaces can be achieved and 25 nm period patterns have already been demonstrated. With further reducing the dimension of the interference mask of EUV-IL or optimizing the e-beam lithography parameters, the sub-20 nm period pattern can be achieved. [2-3]